Mitsubishi Materials had one patents in artificial intelligence during Q4 2023.The patent filed by Mitsubishi Materials Corp in Q4 2023 relates to a plasma-resistant coating film on a substrate, containing Y2O3 particles in a SiO2 film with high film density, small pore size, and low peeling rate. The film density is calculated using image analysis, pores are 5 µm or less in diameter, and peeling rate is 5% or less. GlobalData’s report on Mitsubishi Materials gives a 360-degreee view of the company including its patenting strategy. Buy the report here.
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Mitsubishi Materials grant share with artificial intelligence as a theme is 0% in Q4 2023. Grant share is based on the ratio of number of grants to total number of patents.
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Application: Plasma-resistant coating film, sol gel liquid for forming said film, method for forming plasma-resistant coating film, and substrate with plasma-resistant coating film (Patent ID: US20230313381A1)
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The patent filed by Mitsubishi Materials Corp. describes a plasma-resistant coating film formed on a substrate, consisting of crystalline Y2O3 particles in a SiO2 film. The film has a density of 90% or more, pores with a diameter of 5 µm or less, and a peeling rate of 5% or less. Additionally, the film exhibits a specific atomic concentration ratio of yttrium to silicon, a particular film thickness, and X-ray diffraction characteristics. The substrate can be aluminum, alumina, silicon, or silicon oxide.
Furthermore, the patent includes a sol gel liquid for forming the plasma-resistant coating film, which involves dispersing Y2O3 particles in a silica sol gel liquid. A method for forming the film is also detailed, involving coating, drying, and heat treatment steps. The process can be repeated multiple times, and the substrate can be made of aluminum, alumina, silicon, or silicon oxide. Finally, the patent covers a substrate with the plasma-resistant coating film applied to its surface, providing enhanced protection against plasma-related damage.
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