Materion. has filed a patent for a sputtering target made of Co, Zr, Ta, and optional elements from Mo, Pd, Ni, Ti, V, W, and B. The target has a maximum pass through flux variation of 0.2 or lower, ensuring improved performance in sputtering applications. GlobalData’s report on Materion gives a 360-degree view of the company including its patenting strategy. Buy the report here.

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According to GlobalData’s company profile on Materion, Ceramic composite laminates was a key innovation area identified from patents. Materion's grant share as of January 2024 was 57%. Grant share is based on the ratio of number of grants to total number of patents.

Sputtering target with low magnetic permeability and flux variation

Source: United States Patent and Trademark Office (USPTO). Credit: Materion Corp

The patent application (Publication Number: US20240018645A1) discloses a sputtering target made of an alloy containing Co, Zr, Ta, and optionally one or more additional elements from a specified group. The target is characterized by having a maximum pass-through flux (PTF) variation of 0.2 or lower, ensuring consistent performance during sputtering processes. Ta and Zr are present in specific amounts within the alloy, with the additional elements making up a total of up to 7 at. %. The target also exhibits a maximum magnetic permeability of 60 or lower, with a magnetic pass-through flux of at least 20% in the center of an 8 mm thick test piece.

The patent further details a process for producing the sputtering target, involving a heat treatment of the alloy at temperatures ranging from 700 to 1000°C for 10 to 60 hours. This treatment ensures the target meets the specified PTF variation requirements. Additionally, a magnetron sputtering process is described, utilizing the unique properties of the sputtering target. Variations in the PTF ratio, magnetic permeability, and heat treatment parameters are also disclosed, offering flexibility in tailoring the target's characteristics to specific sputtering applications. Overall, the patent presents a comprehensive approach to designing and manufacturing sputtering targets with improved performance and reliability.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies